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Toshiba has announced development of its BiCS flash three-dimensional (3D) flash memory utilizing through-silicon via (TSV) technology with 3-bit-per-cell (triple-level cell, TLC) technology. Shipments of prototypes for development purposes started in June, and product samples are scheduled for release in the second half of 2017.
Devices fabricated with TSV technology have vertical electrodes and vias that pass through silicon dies to provide connections, an architecture that realizes high speed data input and output while reducing power consumption, Toshiba said. Real-world performance has been proven previously, with the introduction of Toshiba’s 2D NAND flash memory.
Combining a 48-layer 3D flash process and TSV technology has allowed Toshiba to successfully increase product programming bandwidth while achieving low power consumption, the company said. The power efficiency of a single package is approximately twice that of the same-generation BiCS flash memory fabricated with wire-bonding technology. TSV BiCS flash also enables a 1-terabyte (TB) device with a 16-die stacked architecture in a single package.
Toshiba expects to commercialize BiCS flash with TSV technology to provide an ideal solution in respect for storage applications requiring low latency, high bandwidth and high IOPS/Watt, including high-end enterprise SSDs.
Toshiba 3D NAND flash with TSV
Photo: Company
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